| Challenges of Tailoring Surface Chemistry and Plasma/Surface Interactions to Advance Atomic Layer Etching |
tsandberg |
Mar 14, 2016 9:38:01 PM |
| Highly Selective Directional Atomic Layer Etching of Silicon |
tsandberg |
Mar 14, 2016 9:37:42 PM |
| Understanding the mechanism of atomic layer etching and its possible applications |
tsandberg |
Mar 14, 2016 5:58:56 PM |
| Communication—The Role of the Metal-Semiconductor Junction in Pt-Assisted Photochemical Etching of Silicon Carbide |
tsandberg |
Mar 14, 2016 5:57:08 PM |
| Controlled Layer-by-Layer Etching of MoS2 |
tsandberg |
Mar 14, 2016 5:56:47 PM |
| Atomic Layer Etching of AlF3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride |
tsandberg |
Mar 14, 2016 5:56:23 PM |
| Nanoporous SiO2 made by atomic layer deposition and atomic layer etching |
tsandberg |
Mar 14, 2016 5:55:59 PM |
| Flash-Enhanced Atomic Layer Deposition: Basics, Opportunities, Review, and Principal Studies on the Flash-Enhanced Growth of Thin Films |
tsandberg |
Mar 14, 2016 5:55:08 PM |
| Etching or Stabilization of GaAs(001) under Alkali and Halogen Adsorption |
tsandberg |
Mar 14, 2016 5:54:03 PM |
| Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride |
tsandberg |
Mar 14, 2016 5:49:32 PM |
